EM-KLEEN remote plasma source and controller
EM-KLEEN remote plasma cleaner can be used to clean samples and vacuum chambers for electron microscopes and other type analytical instruments, such SEM, FIB, TEM, XPS and SIMS. It can effectively remove hydrocarbon and flurocarbon contaminations inside the high vacuum or ultra-high vacuum chamber, improve the ultimate vacuum level and reduce the pump-down time. It can also remove organic contaminations on the samples surface before surface imaging and analysis. The system consists of a resistive LCD touchscreen controller with embedded microcomputer and a remote plasma source. Remote plasma source should be installed on the vacuum chamber to be cleaned. Standard vacuum interface port is NW/KF40 flange. Adapters for different SEM port are available. CF2.75" flange options is also available.
EM-KLEEN is a fully automatic plasma source. The design is intuitive and versatile. Despite its small size, EM-KLEEN remote plasma source has integrated a pirani pressure sensor, an automatic gas flow controller, a plasma intensity sensor, a temperature sensor and a cooling fan. Flow controller automatically adjust gas flow rate to maintain user specified pressure inside the plasma cleaner chamber. Miniature pressure sensor constantly monitors the sample chamber pressure. It can be used as a safety interlock trigger in the safe operation mode and to count sample loading events for SmartSchedule™ feature. Cooling fan enables high-power high-speed cleaning without causing source overheat. Temperature sensor provides another interlock protection against source overheat during prolonged cleaning at high power. Plasma strength sensor measures the plasma strength in realtime, users are not blind to plasma status anymore.
With pressure sensor, automatic gas flow controller, plasma sensor, temperature sensor and LCD touchscreen controller with embedded microprocessor working in tandem, EM-KLEEN plasma cleaner can take care of your system automatically and provide protection against potential user mistakes. SmartClean™ technology developed by PIE Scientific combines the state-of-the-art plasma source design technology developed in nuclear research and in semiconductor industry. EM-KLEEN plasma cleaners are far more advanced than previous generations of remote plasma cleaners. Additionally, many unique features are only available on our product.
10 minute long scan before and after SEM chamber cleaning
Remove carbon mark created in previous scan with 2-minute plasma cleaning. No more dark scan mark on this sample after 6-minute plasma cleaning. Cleaning speed is 3~5X faster than competitors using the same sample on the same SEM system.