SEMI-KLEEN remote plasma cleaner is designed to meet the tough requirements from semiconductor industry. It can be used on electron beam review system (EBR), electron beam inspection system (EBI), CD-SEM, electron beam lithography system, EUV lithography (EUVL) and EUV mask inspectors. Besides all the standard hardware features on EM-KLEEN plasma cleaners, such as pressure sensor, automatic gas flow controller, plasma strength sensor, temperature sensor, cooling fan and LCD touchscreen controller, SEMI-KLEEN plasma cleaner also integrates the latest plasma source design technologies from semiconductor industry to reduce particle generation risk. Low particulate design on SEMI-KLEEN plasma cleaner has been qualified by semiconductor capital equipment manufacturers and it outperforms competition by multiple orders of magnitude. Standard SEMI-KLEEN plasma cleaner uses high purity quartz tube with external antennas. It can be used to generate air, O2, Ar+O2, H2 and Ar+H2 plasma at low pressure. Proprietary antenna design reduces plasma potential, thus reducing ion sputtering on the source chamber. In addition, chamber materials have been carefully selected to withstand plasma etching. Combined with proprietary dual stage particle filtering technology, SEMI-KLEEN plasma cleaner can meet the toughest PWP requirement from customers like Intel, Samsung and TSMC.
SEMI-KLEEN remote plasma source (left), 75W portable controller (middle), and 150W 3U half rack mount controller (right)
SEM sample cleaning before and after 6 minute remote plasma cleaning. No more hydrocarbon burnmark in subsequent scan!